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Publications in Math-Net.Ru |
Citations |
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2021 |
| 1. |
L. K. Markov, S. A. Kukushkin, I. P. Smirnova, A. S. Pavluchenko, A. S. Grashchenko, A. V. Osipov, G. V. Svyatets, A. E. Nikolaev, A. V. Sakharov, V. V. Lundin, A. F. Tsatsul'nikov, “A light-emitting diode based on alingan heterostructures grown on SiC/Si substrates and its fabrication technology”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:18 (2021), 3–6   |
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N. A. Cherkashin, A. V. Sakharov, A. E. Nikolaev, V. V. Lundin, S. O. Usov, V. M. Ustinov, A. S. Grashchenko, S. A. Kukushkin, A. V. Osipov, A. F. Tsatsul'nikov, “Peculiarities of epitaxial growth of III – N led heterostructures on SiC/Si substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:15 (2021), 15–18 ; Tech. Phys. Lett., 47:10 (2021), 753–756 |
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2020 |
| 3. |
A. V. Myasoedov, A. V. Sakharov, A. E. Nikolaev, A. E. Kalmykov, L. M. Sorokin, V. V. Lundin, “A TEM study of AlN–AlGaN–GaN multilayer buffer structures on silicon substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:19 (2020), 50–54 ; Tech. Phys. Lett., 46:10 (2020), 991–995 |
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2019 |
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A. M. Mizerov, S. N. Timoshnev, E. V. Nikitina, M. S. Sobolev, K. Yu. Shubin, T. N. Berezovskaya, D. V. Mokhov, V. V. Lundin, A. E. Nikolaev, A. D. Bouravlev, “On the specific features of the plasma-assisted mbe synthesis of $n^{+}$-GaN layers on GaN/$c$-Al$_{2}$O$_{3}$ templates”, Fizika i Tekhnika Poluprovodnikov, 53:9 (2019), 1212–1217 ; Semiconductors, 53:9 (2019), 1187–1191 |
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2018 |
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V. V. Lundin, A. V. Sakharov, E. E. Zavarin, D. A. Zakgeim, A. E. Nikolaev, P. N. Brunkov, M. A. Yagovkina, A. F. Tsatsul'nikov, “The effect of the method by which a high-resistivity GaN buffer layer is formed on properties of InAlN/GaN and AlGaN/GaN heterostructures with 2D electron gas”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:13 (2018), 51–58 ; Tech. Phys. Lett., 44:7 (2018), 577–580 |
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2016 |
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A. F. Tsatsul'nikov, V. V. Lundin, A. V. Sakharov, E. E. Zavarin, S. O. Usov, A. E. Nikolaev, M. A. Yagovkina, V. M. Ustinov, N. A. Cherkashin, “Epitaxial growth of GaN/AlN/InAlN heterostructures for HEMTs in horizontal MOCVD reactors with different designs”, Fizika i Tekhnika Poluprovodnikov, 50:9 (2016), 1263–1269 ; Semiconductors, 50:9 (2016), 1241–1247 |
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| 7. |
V. V. Lundin, E. E. Zavarin, P. N. Brunkov, M. A. Yagovkina, S. I. Troshkov, A. V. Sakharov, A. E. Nikolaev, A. F. Tsatsul'nikov, “The influence of growth conditions on the surface morphology and development of mechanical stresses in Al(Ga)N layers during metalorganic vapor phase epitaxy”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:8 (2016), 86–93 ; Tech. Phys. Lett., 42:4 (2016), 431–434 |
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