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Publications in Math-Net.Ru |
Citations |
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2021 |
1. |
B. E. Umirzakov, S. B. Donaev, R. M. Yorkulov, R. Kh. Ashurov, V. M. Rotstein, “Composition and morphology of Si(111) surface with SiO$_{2}$ film of different thickness”, Fizika i Tekhnika Poluprovodnikov, 55:11 (2021), 1045–1048 |
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2020 |
2. |
S. B. Donaev, B. E. Umirzakov, “Effect of the implantation of Al$^+$ ions on the composition, electronic and crystalline structure of the GaP(111) surface”, Fizika i Tekhnika Poluprovodnikov, 54:8 (2020), 716–719 ; Semiconductors, 54:8 (2020), 860–862 |
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3. |
S. B. Donaev, “Nanodimensional CoSiO films obtained by ion implantation on a ŅoSi$_{2}$ surface”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:16 (2020), 16–18 ; Tech. Phys. Lett., 46:8 (2020), 796–798 |
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2019 |
4. |
S. B. Donaev, B. E. Umirzakov, N. M. Mustafaeva, “Emissivity of laser-activated Pd–Ba alloy”, Zhurnal Tekhnicheskoi Fiziki, 89:10 (2019), 1626–1629 ; Tech. Phys., 64:10 (2019), 1541–1543 |
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B. E. Umirzakov, S. B. Donaev, N. M. Mustafaeva, “Electronic and optical properties of GaAlAs/GaAs thin films”, Zhurnal Tekhnicheskoi Fiziki, 89:10 (2019), 1589–1591 ; Tech. Phys., 64:10 (2019), 1506–1508 |
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B. E. Umirzakov, R. Kh. Ashurov, S. B. Donaev, “The morphology and electronic properties of si nanoscale structures on a CaF$_{2}$ surface”, Zhurnal Tekhnicheskoi Fiziki, 89:2 (2019), 264–267 ; Tech. Phys., 64:2 (2019), 232–235 |
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Organisations |
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