Abstract:
The electronic properties of the Ba/3C-SiC(111) nanointerface are for the first time studied by photoelectron spectroscopy with the use of synchrotron radiation in the energy range 80–450 eV. The experiments are performed in situ in ultrahigh vacuum for ultrathin Ba coatings on 3C-SiC(111) samples grown by a new method of substituting substrate atoms. It is found that the adsorption of Ba brings about the appearance of induced surface states with the binding energies 1.9, 6.2, and 7.5 eV. Evolution of the surface states and the spectra of the Si 2p and C 1s core levels shows that the Ba/3C-SiC(111) interface is formed due to charge transfer from Ba adatoms to surface Si atoms and underlying C atoms.
Citation:
G. V. Benemanskaya, P. A. Dementev, S. A. Kukushkin, M. N. Lapushkin, B. V. Senkovskiy, S. N. Timoshnev, “Induced surface states of the ultrathin Ва/3C-SiC(111) interface”, Fizika i Tekhnika Poluprovodnikov, 50:4 (2016), 465–469; Semiconductors, 50:4 (2016), 457–461
\Bibitem{BenDemKuk16}
\by G.~V.~Benemanskaya, P.~A.~Dementev, S.~A.~Kukushkin, M.~N.~Lapushkin, B.~V.~Senkovskiy, S.~N.~Timoshnev
\paper Induced surface states of the ultrathin Ва/3$C$-SiC(111) interface
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2016
\vol 50
\issue 4
\pages 465--469
\mathnet{http://mi.mathnet.ru/phts6487}
\elib{https://elibrary.ru/item.asp?id=25668244}
\transl
\jour Semiconductors
\yr 2016
\vol 50
\issue 4
\pages 457--461
\crossref{https://doi.org/10.1134/S1063782616040072}
Linking options:
https://www.mathnet.ru/eng/phts6487
https://www.mathnet.ru/eng/phts/v50/i4/p465
This publication is cited in the following 2 articles:
G. V. Benemanskaya, P. A. Dementev, S. A. Kukushkin, M. N. Lapushkin, A. V. Osipov, S. N. Timoshnev, “Photoemission studies of the vicinal SiC(100) 4∘ surface and the Cs/SiC(100) 4∘ interface”, Tech. Phys. Lett., 42:12 (2016), 1145–1148
G. V. Benemanskaya, P. A. Dementev, S. A. Kukushkin, M. N. Lapushkin, A. V. Osipov, B. V. Senkovskiy, “The C 1s core level spectroscopy of carbon atoms at the surface SiC/Si(111)-4∘ layer and Cs/SiC/Si(111)-4∘ interface”, Semiconductors, 50:10 (2016), 1327–1332