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Publications in Math-Net.Ru |
Citations |
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2021 |
| 1. |
D. V. Sitanov, S. A. Pivovarenok, D. B. Murin, “The importance of taking into account the heterogeneous recombination of atoms when studying the kinetics of copper etching in chlorine plasma”, TVT, 59:5 (2021), 650–656   ; High Temperature, 60:1, Suppl. 2 (2022), S146–S152 |
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2017 |
| 2. |
D. V. Sitanov, S. A. Pivovarenok, “Heterogeneous recombination of atoms on aluminum samples in chlorine plasma”, TVT, 55:3 (2017), 476–479 ; High Temperature, 55:3 (2017), 455–458   |
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2016 |
| 3. |
A. V. Dunaev, D. B. Murin, S. A. Pivovarenok, “Study of the surface of GaAs after etching in high-frequency and glow discharge plasma by atomic force microscopy”, Fizika i Tekhnika Poluprovodnikov, 50:2 (2016), 167–170 ; Semiconductors, 50:2 (2016), 167–170 |
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2011 |
| 4. |
S. A. Pivovarenok, A. V. Dunaev, D. B. Murin, A. M. Efremov, V. I. Svettsov, “Effect of Mixture Composition on the Electrophysical Parameters and Emission Spectra of $\mathrm{HCl}$–$\mathrm{O}_2$ and $\mathrm{HCl}$–$\mathrm{Ar}$ Plasma”, TVT, 49:4 (2011), 509–512 ; High Temperature, 49:4 (2011), 491–494 |
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