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Semiconductors
Intensity distribution of the three-wave diffraction from dislocation epitaxial layers in the reciprocal space
R. N. Kyutt Ioffe Institute, St. Petersburg
Abstract:
The three-wave X-ray diffraction in strongly disordered epitaxial layers of GaN and ZnO is experimentally investigated. The charts of the intensity distribution in the reciprocal space are plotted in coordinates qθ and qφ for the most intensive three-wave combination (1010)/(1011) by means of subsequent θ- and qφ-scanning. A nontrivial shape of the θ-sections of these contours at a distance from the qφ center of reflection is revealed; it is different for different samples. For the θ-curves at the center of reflection, we observed a common peak that may be approximated by the Voigt function with a power-low decrease in the intensity at the wings; the decrease law (from -4.5 to -5.0) is found to be considerably greater than that for the similar curves of two-wave diffraction and not depending on the dislocation density and distribution in layers. In some films we observed a coarse-block structure; in addition, it follows from the distribution in the reciprocal space that these blocks are turned with respect to each other around a normal to the surface, which allows us to suggest the existence of low-angle boundaries between them, consisting exclusively of edge dislocations.
Received: 03.11.2017
Citation:
R. N. Kyutt, “Intensity distribution of the three-wave diffraction from dislocation epitaxial layers in the reciprocal space”, Fizika Tverdogo Tela, 60:4 (2018), 691–695; Phys. Solid State, 60:4 (2018), 695–699
Linking options:
https://www.mathnet.ru/eng/ftt9230 https://www.mathnet.ru/eng/ftt/v60/i4/p691
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Abstract page: | 54 | Full-text PDF : | 22 |
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