|
|
Публикации в базе данных Math-Net.Ru |
Цитирования |
|
2020 |
1. |
H. E. Doghmane, T. Touam, A. Chelouche, F. Challali, B. Bordji, “Investigation of the influences of post-thermal annealing on physical properties of TiO$_{2}$ thin films deposited by RF sputtering”, Физика и техника полупроводников, 54:2 (2020), 217 ; Semiconductors, 54:2 (2020), 268–273 |
15
|
|