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Publications in Math-Net.Ru |
Citations |
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2018 |
1. |
V. B. Odzaev, A. N. Pyatlitski, V. I. Plebanovich, P. K. Sadovskii, M. I. Tarasik, A. R. Chelyadinskii, “Interaction between antimony atoms and micropores in silicon”, Fizika Tverdogo Tela, 60:1 (2018), 22–24 ; Phys. Solid State, 60:1 (2018), 20–22 |
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2003 |
2. |
A. R. Chelyadinskii, F. F. Komarov, “Defect-impurity engineering in implanted silicon”, UFN, 173:8 (2003), 813–846 ; Phys. Usp., 46:8 (2003), 789–820 |
33
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1995 |
3. |
V. S. Vavilov, A. R. Chelyadinskii, “Impurity ion implantation into silicon single crystals: efficiency and radiation damage”, UFN, 165:3 (1995), 347–358 ; Phys. Usp., 38:3 (1995), 333–343 |
18
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1991 |
4. |
V. S. Varichenko, A. M. Zaitsev, N. A. Kudelevich, A. R. Chelyadinskii, “Spatial distribution, accumulation and annealing of radiation defects created in silicon by energetic argon and nickel ions”, Fizika Tverdogo Tela, 33:12 (1991), 3552–3555 |
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Organisations |
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