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Balakshin, Yurii Viktorovich

Statistics Math-Net.Ru
Total publications: 6
Scientific articles: 6

Number of views:
This page:116
Abstract pages:278
Full texts:115
Candidate of physico-mathematical sciences

https://www.mathnet.ru/eng/person184932
List of publications on Google Scholar
List of publications on ZentralBlatt

Publications in Math-Net.Ru Citations
2021
1. E. M. Elsehly, A. P. Evseev, E. A. Vorobyeva, Yu. V. Balakshin, N. G. Chechenin, A. A. Shemukhin, “Influence of irradiation with argon ions on the filtration properties of multi-walled carbon nanotubes”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:18 (2021),  21–25  mathnet  elib
2019
2. A. I. Morkovkin, E. A. Vorobyeva, A. P. Evseev, Yu. V. Balakshin, A. A. Shemukhin, “Modification of carbon nanotubes wettability by ion irradiation”, Fizika i Tekhnika Poluprovodnikov, 53:12 (2019),  1692–1696  mathnet  elib; Semiconductors, 53:12 (2019), 1683–1687 6
3. Yu. V. Balakshin, A. V. Kozhemiako, S. Petrovic, M. Erich, A. A. Shemukhin, V. S. Chernysh, “Influence of the charge state of xenon ions on the depth distribution profile upon implantation into silicon”, Fizika i Tekhnika Poluprovodnikov, 53:8 (2019),  1030–1036  mathnet  elib; Semiconductors, 53:8 (2019), 1011–1017 3
4. A. V. Kozhemiako, A. P. Evseev, Yu. V. Balakshin, A. A. Shemukhin, “Features of defect formation in the nanostructured silicon under ion irradiation”, Fizika i Tekhnika Poluprovodnikov, 53:6 (2019),  810–815  mathnet  elib; Semiconductors, 53:6 (2019), 800–805 9
2018
5. Yu. V. Balakshin, A. A. Shemukhin, A. V. Nazarov, A. V. Kozhemiako, V. S. Chernysh, “In situ modification and analysis of the composition and crystal structure of a silicon target by ion-beam methods”, Zhurnal Tekhnicheskoi Fiziki, 88:12 (2018),  1900–1907  mathnet  elib; Tech. Phys., 63:12 (2018), 1861–1867 19
2017
6. A. V. Kozhemiako, Yu. V. Balakshin, A. A. Shemukhin, V. S. Chernysh, “Study of the distribution profile of iron ions implanted into silicon”, Fizika i Tekhnika Poluprovodnikov, 51:6 (2017),  778–782  mathnet  elib; Semiconductors, 51:6 (2017), 745–750 5

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