1. |
D. B. Abramenko, P. S. Antsiferov, D. I. Astakhov, A. Yu. Vinokhodov, I. Yu. Vichev, R. R. Gayazov, A. S. Grushin, L. A. Dorokhin, V. V. Ivanov, D. A. Kim, K. N. Koshelev, P. V. Krainov, M. S. Krivokorytov, V. M. Krivtsun, B. V. Lakatosh, A. A. Lash, V. V. Medvedev, A. N. Ryabtsev, Yu. V. Sidelnikov, E. P. Snegirev, A. D. Solomyannaya, M. V. Spiridonov, I. P. Tsygvintsev, O. F. Yakushev, A. A. Yakushkin, “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)”, UFN, 189:3 (2019), 323–334 ; Phys. Usp., 62:3 (2019), 304–314 |
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