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This article is cited in 14 scientific papers (total in 14 papers)
CONFERENCES AND SYMPOSIA
Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)
D. B. Abramenkoab, P. S. Antsiferova, D. I. Astakhovac, A. Yu. Vinokhodovb, I. Yu. Vichevd, R. R. Gayazova, A. S. Grushind, L. A. Dorokhina, V. V. Ivanovab, D. A. Kimd, K. N. Koshelevab, P. V. Krainove, M. S. Krivokorytovabe, V. M. Krivtsunabe, B. V. Lakatoshe, A. A. Lashb, V. V. Medvedevace, A. N. Ryabtseva, Yu. V. Sidelnikova, E. P. Snegireva, A. D. Solomyannayad, M. V. Spiridonovfb, I. P. Tsygvintsevd, O. F. Yakushevg, A. A. Yakushkinb a Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Moscow
b EUV Labs, Ltd., Troitsk, Moscow
c ISTEQ B.V., Eindhoven, Netherlands
d Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Moscow
e Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow region
f Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow
g Lebedev Physical Institute, Russian Academy of Sciences, Moscow
Abstract:
We report on the development of plasma-based sources of extreme ultraviolet radiation for the next-generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.
Received: August 28, 2018 Accepted: June 20, 2018
Citation:
D. B. Abramenko, P. S. Antsiferov, D. I. Astakhov, A. Yu. Vinokhodov, I. Yu. Vichev, R. R. Gayazov, A. S. Grushin, L. A. Dorokhin, V. V. Ivanov, D. A. Kim, K. N. Koshelev, P. V. Krainov, M. S. Krivokorytov, V. M. Krivtsun, B. V. Lakatosh, A. A. Lash, V. V. Medvedev, A. N. Ryabtsev, Yu. V. Sidelnikov, E. P. Snegirev, A. D. Solomyannaya, M. V. Spiridonov, I. P. Tsygvintsev, O. F. Yakushev, A. A. Yakushkin, “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)”, UFN, 189:3 (2019), 323–334; Phys. Usp., 62:3 (2019), 304–314
Linking options:
https://www.mathnet.ru/eng/ufn6375 https://www.mathnet.ru/eng/ufn/v189/i3/p323
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Abstract page: | 297 | Full-text PDF : | 32 | References: | 37 | First page: | 15 |
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