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Uspekhi Fizicheskikh Nauk, 2019, Volume 189, Number 3, Pages 323–334
DOI: https://doi.org/10.3367/UFNr.2018.06.038447 (Mi ufn6375) 		 
This article is cited in 14 scientific papers (total in 14 papers)

CONFERENCES AND SYMPOSIA

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)

D. B. Abramenkoab, P. S. Antsiferova, D. I. Astakhovac, A. Yu. Vinokhodovb, I. Yu. Vichevd, R. R. Gayazova, A. S. Grushind, L. A. Dorokhina, V. V. Ivanovab, D. A. Kimd, K. N. Koshelevab, P. V. Krainove, M. S. Krivokorytovabe, V. M. Krivtsunabe, B. V. Lakatoshe, A. A. Lashb, V. V. Medvedevace, A. N. Ryabtseva, Yu. V. Sidelnikova, E. P. Snegireva, A. D. Solomyannayad, M. V. Spiridonovfb, I. P. Tsygvintsevd, O. F. Yakushevg, A. A. Yakushkinb

a Institute of Spectroscopy, Russian Academy of Sciences, Troitsk, Moscow
b EUV Labs, Ltd., Troitsk, Moscow
c ISTEQ B.V., Eindhoven, Netherlands
d Keldysh Institute of Applied Mathematics, Russian Academy of Sciences, Moscow
e Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow region
f Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow
g Lebedev Physical Institute, Russian Academy of Sciences, Moscow
Full-text PDF (1533 kB) Citations (14)
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DOI: https://doi.org/10.3367/UFNr.2018.06.038447
Abstract: We report on the development of plasma-based sources of extreme ultraviolet radiation for the next-generation lithography and mask inspection and the development of equipment for spectral diagnostics of such sources.
Funding agency Grant number
Russian Science Foundation 14-11-00699
Russian Foundation for Basic Research 16-02-00753
This study was financially supported in part by the Russian Science Foundation (Project No. 14-11-00699) and by the Russian Foundation for Basic Research (Agreement No. 16-02-00753).
Received: August 28, 2018
Accepted: June 20, 2018
English version:
Physics–Uspekhi, 2019, Volume 62, Issue 3, Pages 304–314
DOI: https://doi.org/10.3367/UFNe.2018.06.038447
Bibliographic databases:
Document Type: Article
PACS: 42.82.Cr, 52.25.Os, 52.59.-f, 52.70.-m, 52.77.-j
Language: Russian
Citation: D. B. Abramenko, P. S. Antsiferov, D. I. Astakhov, A. Yu. Vinokhodov, I. Yu. Vichev, R. R. Gayazov, A. S. Grushin, L. A. Dorokhin, V. V. Ivanov, D. A. Kim, K. N. Koshelev, P. V. Krainov, M. S. Krivokorytov, V. M. Krivtsun, B. V. Lakatosh, A. A. Lash, V. V. Medvedev, A. N. Ryabtsev, Yu. V. Sidelnikov, E. P. Snegirev, A. D. Solomyannaya, M. V. Spiridonov, I. P. Tsygvintsev, O. F. Yakushev, A. A. Yakushkin, “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)”, UFN, 189:3 (2019), 323–334; Phys. Usp., 62:3 (2019), 304–314
Citation in format AMSBIB
\Bibitem{AbrAntAst19}
\by D.~B.~Abramenko, P.~S.~Antsiferov, D.~I.~Astakhov, A.~Yu.~Vinokhodov, I.~Yu.~Vichev, R.~R.~Gayazov, A.~S.~Grushin, L.~A.~Dorokhin, V.~V.~Ivanov, D.~A.~Kim, K.~N.~Koshelev, P.~V.~Krainov, M.~S.~Krivokorytov, V.~M.~Krivtsun, B.~V.~Lakatosh, A.~A.~Lash, V.~V.~Medvedev, A.~N.~Ryabtsev, Yu.~V.~Sidelnikov, E.~P.~Snegirev, A.~D.~Solomyannaya, M.~V.~Spiridonov, I.~P.~Tsygvintsev, O.~F.~Yakushev, A.~A.~Yakushkin
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