Russian Chemical Reviews
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive
Impact factor
Guidelines for authors

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS


Usp. Khim.:
Year:
Volume:
Issue:
Page:
Find




Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register

Russian Chemical Reviews, 2014, Volume 83, Issue 8, Pages 758–782
DOI: https://doi.org/10.1070/RC2014v083n08ABEH004402 (Mi rcr711) 		 
This article is cited in 9 scientific papers (total in 9 papers)

Chemical vapour-phase deposition of ruthenium-containing thin films

V. Yu. Vasilevab, N. B. Morozovac, I. K. Igumenovc

a Novosibirsk State Technical University
b 'SibIS', Limited Liability Company, Novosibirsk, Russia
c Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
English full-text Citations (9)
DOI: https://doi.org/10.1070/RC2014v083n08ABEH004402
Abstract: Chemical and materials science aspects of formation of ruthenium-containing thin films for modern high-precision technologies by chemical vapour deposition (CVD) methods are considered. Chemical approaches to the synthesis of main precursors used in MOCVD techniques, layer growth processes as well as main physicochemical and electrical properties of ruthenium-containing thin films are analyzed.
Bibliography — 120 references.
Received: 24.04.2013
Russian version:
Uspekhi Khimii, 2014, Volume 83, Issue 8, Pages 758–782
DOI: https://doi.org/10.1070/RC2014v083n08ABEH004402
Bibliographic databases:
Language: English
Original paper language: Russian
Citation: V. Yu. Vasilev, N. B. Morozova, I. K. Igumenov, “Chemical vapour-phase deposition of ruthenium-containing thin films”, Usp. Khim., 83:8 (2014), 758–782; Russian Chem. Reviews, 83:8 (2014), 758–782
Citation in format AMSBIB
\Bibitem{VasMorIgu14}
\by V.~Yu.~Vasilev, N.~B.~Morozova, I.~K.~Igumenov
\paper Chemical vapour-phase deposition of ruthenium-containing thin films
\jour Usp. Khim.
\yr 2014
\vol 83
\issue 8
\pages 758--782
\mathnet{http://mi.mathnet.ru/rcr711}
\crossref{https://doi.org/10.1070/RC2014v083n08ABEH004402}
\elib{https://elibrary.ru/item.asp?id=21818616}
\transl
\jour Russian Chem. Reviews
\yr 2014
\vol 83
\issue 8
\pages 758--782
\crossref{https://doi.org/10.1070/RC2014v083n08ABEH004402}
\isi{https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=Publons&SrcAuth=Publons_CEL&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=000343310000004}
\elib{https://elibrary.ru/item.asp?id=23987691}
\scopus{https://www.scopus.com/record/display.url?origin=inward&eid=2-s2.0-84906905523}
Linking options:
  • https://www.mathnet.ru/eng/rcr711
  • https://doi.org/10.1070/RC2014v083n08ABEH004402
  • https://www.mathnet.ru/eng/rcr/v83/i8/p758
    • This publication is cited in the following 9 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    		Успехи химии Russian Chemical Reviews
    Statistics & downloads:
    Abstract page:154
     
      Contact us:
    		  Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2024