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Publications in Math-Net.Ru |
Citations |
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2021 |
| 1. |
S. D. Poletayev, A. I. Lyubimov, “Specific features of matching of a lower electrode and an RF bias generator for reactive ion etching of bulk substrates”, Zhurnal Tekhnicheskoi Fiziki, 91:4 (2021), 657–663   ; Tech. Phys., 66:12 (2021), 1294–1300  |
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| 2. |
S. D. Poletayev, A. I. Lyubimov, “Influence of the asymmetry of the metal mask arrangement on the matching of the lower electrode with a high-frequency displacement generator during reactive-ion etching of massive substrates”, Fizika i Tekhnika Poluprovodnikov, 55:12 (2021), 1255–1259 |
| 3. |
S. D. Poletayev, A. I. Lyubimov, “The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at reactive ion etching of large substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:11 (2021), 44–47 ; Tech. Phys. Lett., 47:8 (2021), 569–572 |
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