He received his M.S. degree in Applied Mathematics and Physics from Moscow Institute of Physics and Technologies in 2005, and Ph.D. degree in Polymer Physics in 2009. Currently he is a senior researcher at the Enikolopov Institute of Synthetic Polymer Materials of the Russian Academy of Sciences. His current research focuses on the scanning probe microscopy, thin polymer and hybrid films.
M. A. Bruk, E. N. Zhikharev, D. R. Streltsov, V. A. Kalnov, A. V. Spirin, A. E. Rogozhin, “Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist”, Computer Optics, 39:2 (2015), 204–210
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