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Publications in Math-Net.Ru |
Citations |
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2017 |
| 1. |
A. E. Rogozhin, M. A. Bruk, E. N. Zhikharev, F. A. Sidorov, “Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins”, Computer Optics, 41:4 (2017), 499–503  |
4
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2015 |
| 2. |
M. A. Bruk, E. N. Zhikharev, D. R. Streltsov, V. A. Kalnov, A. V. Spirin, A. E. Rogozhin, “Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist”, Computer Optics, 39:2 (2015), 204–210 |
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1987 |
| 3. |
M. A. Bruk, “The Radiation Polymerisation of Monomers Adsorbed on Solid Surfaces”, Usp. Khim., 56:1 (1987), 148–174 ; Russian Chem. Reviews, 56:1 (1987), 81–96  |
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1964 |
| 4. |
M. A. Bruk, A. D. Abkin, P. M. Khomikovskii, G. A. Golder, Zhu Siang-ling, “Some problems presented by the radiation polymerization and copolymerization of tetrafluoroethylene in the solid state”, Dokl. Akad. Nauk SSSR, 157:6 (1964), 1399–1402 |
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1963 |
| 5. |
M. A. Bruk, A. D. Abkin, P. M. Khomikovskii, “Radiation polymerization of tetrafluoroethylene in the solid state”, Dokl. Akad. Nauk SSSR, 149:6 (1963), 1322–1325 |
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