Study of the structural and magnetic characteristics of epitaxial Fe$_3$Si/Si(111) films

The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7$\times$7 surface at a substrate temperature of $150\,^\circ$C have been presented. The epitaxial structure has been identified as a single-crystal Fe$_3$Si silicide film with the orientation Si[111]$\parallel$Fe$_3$Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy ($H_a=26\,$Oe) and a relatively narrow uniform ferromagnetic resonance line ($\Delta H=11.57\,$Oe) measured at a pump frequency of $2.274$ GHz.