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This article is cited in 6 scientific papers (total in 6 papers)
Surface physics, thin films
Deposition of NiFe(200) and NiFe(111) textured films onto Si/SiO$_{2}$ substrates by DC magnetron sputtering
A. S. Dzhumalievab, Yu. V. Nikulinba, Yu. A. Filimonovbac a Saratov State University
b Saratov Branch of the Institute of Radio Engineering and Electronics
c Yuri Gagarin State Technical University of Saratov
Abstract:
The effect of substrate temperature $T_{\operatorname{sub}}$ and bias voltage $U_{\operatorname{bias}}$ on the texture of NiFe films with thickness $d\sim$ 30–340 nm deposited by DC magnetron sputtering onto Si(111)/SiO$_2$ substrates under working gas pressure $\sim$0.2 Pa has been investigated. It has been demonstrated that films grown at room substrate temperature have the (111) texture that is refined under a negative bias voltage. The deposition of films onto a grounded ($U_{\operatorname{bias}}\sim$ 0) substrate heated to $T_{\operatorname{sub}}\sim$ 440–640 K results in the formation of textured NiFe(200) films.
Keywords:
Substrate Temperature, Bias Voltage, Interplanar Distance, Heated Substrate, Negative Bias Voltage.
Received: 27.10.2015
Citation:
A. S. Dzhumaliev, Yu. V. Nikulin, Yu. A. Filimonov, “Deposition of NiFe(200) and NiFe(111) textured films onto Si/SiO$_{2}$ substrates by DC magnetron sputtering”, Fizika Tverdogo Tela, 58:5 (2016), 1019–1023; Phys. Solid State, 58:5 (2016), 1053–1057
Linking options:
https://www.mathnet.ru/eng/ftt9995 https://www.mathnet.ru/eng/ftt/v58/i5/p1019
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