Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering

The influence of the bias voltage polarity $U_s$ on microstructure, crystallographic texture and magnetic properties has been investigated for Ni films with a thickness of $\approx$ 15–420 nm, which are obtained via magnetron sputtering at a working gas pressure $P$ corresponding to the collision-deficient flight mode of atoms of the sputtered target between the target and the substrate. The Ni(111)-textured films have been shown to form at $U_{s}\approx$ -100 V, whose microstructure and magnetic parameters are almost unchanged with a thickness. In contrast, the Ni(200) films are formed at $U_{s}\approx$ +100 V, whose magnetic properties and micro-structure depend significantly on the thickness $d$ that manifests in a critical thickness $d^*\approx$ 150 nm, when the structure of the film becomes inhomogeneous in the thickness, the remagnetization loops are changed from rectangular to supercritical with the formation of the band domain structure.