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This article is cited in 2 scientific papers (total in 2 papers)
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Electronic structure of an ultrathin molybdenum oxide film
P. A. Dementeva, E. V. Ivanovaa, M. N. Lapushkina, D. A. Smirnovb, S. N. Timoshnevc a Ioffe Institute, St. Petersburg
b Institut für Festkörper- und Materialphysik, Technische Universität Dresden, Germany
c Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
Abstract:
The electronic structure of an ultra-thin molybdenum oxide film obtained by oxidation of molybdenum at an oxygen pressure of 1 Torr and the effect of adsorption of sodium atoms Na on its electronic structure are studied by ultra-vacuum photoelectron spectroscopy in ultrahigh vacuum. Photoemission spectra from the valence band and core levels of O $2s$, Mo $3d$ Mo $3p$, and Na $1p$ are studied, upon synchrotron excitation in the photon energy range 80 – 600 eV. It is shown that in the formed oxide film, molybdenum is in two states: Mo$^{6+}$ and Mo$^{4+}$. On the surface of the oxide, oxygen is induced both in the composition of the oxides and in hydroxyl. It was shown that MoO$_3$ is formed on the surface, and MoO$_2$ at a distance from the surface. The deposition of Na atoms leads to intercalation of the molybdenum oxide layer.
Keywords:
molybdenum oxides, photoemission, sodium, intercalation.
Received: 04.06.2020 Revised: 04.06.2020 Accepted: 04.06.2020
Citation:
P. A. Dementev, E. V. Ivanova, M. N. Lapushkin, D. A. Smirnov, S. N. Timoshnev, “Electronic structure of an ultrathin molybdenum oxide film”, Fizika Tverdogo Tela, 62:10 (2020), 1618–1626; Phys. Solid State, 62:10 (2020), 1787–1795
Linking options:
https://www.mathnet.ru/eng/ftt8282 https://www.mathnet.ru/eng/ftt/v62/i10/p1618
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