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Semiconductors
Tensostimulated effect in a doped and heat-treated silicon at an oriented deformation
O. O. Mamatkarimova, O. Khimmatkulovb, I. G. Tursunovcd a Namangan Engineering and Technology Institute, Namangan, Uzbekistan
b Tashkent State Technical University, Tashkent, Uzbekistan
c Chirchiq State Pedagogical Institute, Chirchik, Uzbekistan
d National University of Uzbekistan named after M. Ulugbek, Tashkent, Uzbekistan
Abstract:
The tensostimulated effect in heat-treated and doped silicon was investigated. It is shown that uniaxial compression in the [111] direction leads to the decay of thermal donors and the hysteresis development in the dependences of the resistivity on the compression value. It was found that the strain-stimulated effect in manganese-compensated silicon samples is due to simultaneous changes in the concentration and mobility of current carriers.
Keywords:
deformation, tensoresistance, silicon, alloying, uniaxial.
Received: 17.12.2020 Revised: 17.12.2020 Accepted: 14.01.2021
Citation:
O. O. Mamatkarimov, O. Khimmatkulov, I. G. Tursunov, “Tensostimulated effect in a doped and heat-treated silicon at an oriented deformation”, Fizika Tverdogo Tela, 63:5 (2021), 602–605; Phys. Solid State, 63:5 (2021), 738–741
Linking options:
https://www.mathnet.ru/eng/ftt8127 https://www.mathnet.ru/eng/ftt/v63/i5/p602
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Abstract page: | 61 | Full-text PDF : | 36 |
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