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Semiconductors
Effect of electron and hole doping on the transport characteristics of chalcogenide systems
O. B. Romanovaa, S. S. Aplesninab, L. V. Udodab a L. V. Kirensky Institute of Physics, Siberian Branch of the Russian Academy of Sciences, Krasnoyarsk, Russia
b M. F. Reshetnev Siberian State University of Science and Technologies, Krasnoyarsk, Russia
Abstract:
The electrical properties of the Ag$_{0.01}$Mn$_{0.99}$S and Tm$_{0.01}$Mn$_{0.99}$S semiconductor compounds and the Hall effect in them have been investigated in the temperature range of 80–400 K in a magnetic field of 12 kOe. Using the I–V characteristics, the conductivity mechanism depending on the doping type and concentration has been established. Upon substitution of silver for manganese, the Mott-type conductivity has been found, while substitution of thulium causes the ohmic conductivity. The mobility and type of carriers have been determined from the Hall constant data.
Keywords:
semiconductors, conductivity, Hall constant, mobility.
Received: 24.12.2020 Revised: 24.12.2020 Accepted: 19.01.2021
Citation:
O. B. Romanova, S. S. Aplesnin, L. V. Udod, “Effect of electron and hole doping on the transport characteristics of chalcogenide systems”, Fizika Tverdogo Tela, 63:5 (2021), 606–609; Phys. Solid State, 63:5 (2021), 754–757
Linking options:
https://www.mathnet.ru/eng/ftt8128 https://www.mathnet.ru/eng/ftt/v63/i5/p606
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Abstract page: | 33 | Full-text PDF : | 12 |
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