Abstract:
Thin nanocrystalline Ni films with a thickness of ∼ 340–360 nm were synthesized by ion sputtering on single-crystal Si (111) substrates under high vacuum conditions. The structure, magnetic phase composition, and magnetic properties of the as-deposited and thermally annealed Ni films were studied by X-ray diffraction, scanning electron microscopy with microanalysis, vibration magnetometry, and differential thermomagnetic analysis. It was found that, under certain deposition regimes, the as-deposited nickel films at room temperature have a saturation magnetization by an order of magnitude lower than that of nickel, and after thermal annealing at a temperature of 723 K they exhibit magnetic anisotropy perpendicular to the surface. It is shown that the reduced value of the saturation magnetization is associated with a significant (3%) tensile strain of the crystal lattice of the nickel. It was found that the perpendicular magnetic anisotropy of the annealed films is due to the presence of tensile macrostresses due to differences in the thermal expansion coefficients of the film and substrate.
Keywords:
ion sputtering, nanocrystalline nickel films, structure, magnetic properties.
Program of Strategic Academic Leadership of Kazan (Volga Region) Federal University
The study was performed as a part of State Assignment of the Kazan Institute of Physics and Technology, Federal Research Center, Kazan Scientific Center of the Russian Academy of Sciences no. АААА-А18-118041760011-2. DTMA of the samples was carried out by Sh.Z. Ibragimov and D.M. Kuzina at the expense of Program of Strategic Academic Leadership of Kazan (Volga Region) Federal University.
Citation:
N. M. Lyadov, V. V. Bazarov, I. R. Vakhitov, A. I. Gumarov, Sh. Z. Ibragimov, D. M. Kuzina, I. A. Faizrakhmanov, R. I. Khaibullin, V. A. Shustov, “Structure features of the nanocrystalline Ni films formed by ion sputtering technique”, Fizika Tverdogo Tela, 63:10 (2021), 1687–1693; Phys. Solid State, 63:11 (2021), 1723–1729
\Bibitem{LyaBazVak21}
\by N.~M.~Lyadov, V.~V.~Bazarov, I.~R.~Vakhitov, A.~I.~Gumarov, Sh.~Z.~Ibragimov, D.~M.~Kuzina, I.~A.~Faizrakhmanov, R.~I.~Khaibullin, V.~A.~Shustov
\paper Structure features of the nanocrystalline Ni films formed by ion sputtering technique
\jour Fizika Tverdogo Tela
\yr 2021
\vol 63
\issue 10
\pages 1687--1693
\mathnet{http://mi.mathnet.ru/ftt8009}
\crossref{https://doi.org/10.21883/FTT.2021.10.51424.117}
\elib{https://elibrary.ru/item.asp?id=46598591}
\transl
\jour Phys. Solid State
\yr 2021
\vol 63
\issue 11
\pages 1723--1729
\crossref{https://doi.org/10.1134/S1063783421100231}
Linking options:
https://www.mathnet.ru/eng/ftt8009
https://www.mathnet.ru/eng/ftt/v63/i10/p1687
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