Formation of threadlike nanostructures of silicon and silicon carbide by chemical vapor deposition

Synthesis of threadlike nanostructures of silicon and silicon carbide by chemical vapor deposition (CVD) using dichlorosilane pyrolysis in the presence of CCl₄ and CF₂Cl₂ in nitrogen has been carried out. Nitrogen molecules react on active surface areas of the substrate originating during etching with a gaseous mixture of 7.5% SiH₂Cl₂–7.5% CCl₄–85% N₂.