H. E. Doghmane, T. Touam, A. Chelouche, F. Challali, B. Bordji, “Investigation of the influences of post-thermal annealing on physical properties of TiO$_{2}$ thin films deposited by RF sputtering”, Fizika i Tekhnika Poluprovodnikov, 54:2 (2020), 217; Semiconductors, 54:2 (2020), 268–273
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