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Publications in Math-Net.Ru |
Citations |
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2021 |
| 1. |
G. A. Illarionov, D. S. Kolchanov, V. V. Chrishtop, I. A. Kasatkin, A. V. Vinogradov, M. I. Morozov, “Study of the resistive switching and electrode degradation in Al/TiO$_2$/FTO thin films upon thermal treatment in reducing atmosphere”, Nanosystems: Physics, Chemistry, Mathematics, 12:6 (2021), 783–791    |
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P. V. Seredin, A. S. Len'shin, Abduljabbar Riyad Khuder, D. L. Goloshchapov, M. A. Kharajidi, I. N. Arsent'ev, I. A. Kasatkin, “Properties of compliant porous silicon-based substrates formed by two-stage etching”, Fizika i Tekhnika Poluprovodnikov, 55:11 (2021), 1021–1026 |
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P. V. Seredin, K. A. Barkov, D. L. Goloshchapov, A. S. Len'shin, Yu. Yu. Khudyakov, I. N. Arsent'ev, A. A. Lebedev, Sh. Sh. Sharofidinov, A. M. Mizerov, I. A. Kasatkin, T. Prutskij, “Effect of pretreatment of the silicon substrate on the properties of GaN films grown by chloride–hydride vapor-phase epitaxy”, Fizika i Tekhnika Poluprovodnikov, 55:8 (2021), 704–710 ; Semiconductors, 55:12 (2021), 995–1001 |
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2020 |
| 4. |
I. P. Dobrovol'skaya, K. V. Malafeev, Yu. A. Nashchekina, I. A. Kasatkin, E. N. Popova, V. E. Yudin, “The effect of ammonium chloride on the structure of hydroxyapatite nanoparticles and the proliferative activity of mesenchymal stromal cells”, Zhurnal Tekhnicheskoi Fiziki, 90:9 (2020), 1596–1600 ; Tech. Phys., 65:9 (2020), 1530–1534 |
| 5. |
S. A. Kukushkin, A. V. Osipov, A. I. Romanychev, I. A. Kasatkin, A. S. Loshachenko, “Low-temperature growth of the CdS cubic phase by atomic-layer deposition on SiC/Si hybrid substrates”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:21 (2020), 3–6 ; Tech. Phys. Lett., 46:11 (2020), 1049–1052 |
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