PhD student of Moscow Institute of Physics and Technology, engineer at Institute of Physics and Technology of RAS (IPT RAS). Field of research: scanning electron microscopy, electron lithography, electron simulation in solids.
A. E. Rogozhin, M. A. Bruk, E. N. Zhikharev, F. A. Sidorov, “Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins”, Computer Optics, 41:4 (2017), 499–503
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