PhD, senior researcher in Institute of Physics and Technology of RAS (IPT RAS), in 2006 graduated from Moscow Institute of Physics and Technology (MIPT), defended PhD thesis in 2009. Field of research: high-k dielectrics, contact systems for MOSFETs, atomic force microscopy, CV- and IV-measurements.
A. E. Rogozhin, M. A. Bruk, E. N. Zhikharev, F. A. Sidorov, “Nanophotonic structure formation by dry e-beam etching of the resist: resolution limitation origins”, Computer Optics, 41:4 (2017), 499–503
M. A. Bruk, E. N. Zhikharev, D. R. Streltsov, V. A. Kalnov, A. V. Spirin, A. E. Rogozhin, “Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist”, Computer Optics, 39:2 (2015), 204–210
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