Researcher in L.Ya. Karpov Research Institute of Physical Chemistry.ñField of research: chemistry of polymers, thin polymer films for micro- and nanoelectronics, electron beam lithography.
M. A. Bruk, E. N. Zhikharev, D. R. Streltsov, V. A. Kalnov, A. V. Spirin, A. E. Rogozhin, “Some peculiarities of a new method of microrelief creation by the direct electron-beam etching of resist”, Computer Optics, 39:2 (2015), 204–210
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