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Walter Schottky Institut, Technische Universität München, Germany
Address: Germany, D-85748, Garching, Am Coulombwall, 3
Phone: +49 (89) 289 12 761
Website: https://www.wsi.tum.de
Number of authors: 11
Number of publications: 5

Personnel: A B F H K M W Z
full list
  • Abstreiter, G
  • Bichler, M
  • Boehm, G
  • Finley, J J
  • Hagn, M
  • Koblmuller, G
  • Muller, K
  • Weimann, G
  • Zon, Vera Borisovna
  • Zrenner, A
  • The Walter Schottky Institut (WSI) is a central institute of the Technische Universität München (TUM) which was founded in 1986 in order to strengthen the interaction between basic physics and semiconductor electronics research. It became operational in May 1988. The institute building contains laboratories and offices with a total area of about 2400 m2.

    Today the WSI accommodates 8 research groups. The individual research groups offer attractive research opportunities for diploma (graduate) students, PhD students and postdoctoral fellows. The institute is well funded by several German research agencies and industries and equipped with state of the art fabrication and characterization tools for semiconductors that put it at the forefront of international semiconductor research. No less than eight molecular beam epitaxy machines have led to several world records in the fabrication of laser and nanoelectronic structures and devices.

    Source: https://www.wsi.tum.de


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