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Vestnik SamGU. Estestvenno-Nauchnaya Ser., 2011, Issue 5(86), Pages 115–121
(Mi vsgu85)
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This article is cited in 1 scientific paper (total in 1 paper)
Physics
Photosensitive matrix based on porous microcrystalline silicon
N. V. Latukhinaa, G. A. Pisarenkoa, A. V. Volkovb, V. A. Kitaevab a Dept. Of Semi-Conductor Electronics and Nano-Technology, Samara
State University, Samara, 443011, Russian Federation
b Dept. of Nano-Engineering, Samara State Aerospace University, Samara, 443086, Russian Federation
(published under the terms of the Creative Commons Attribution 4.0 International License)
Abstract:
The article presents the results of experimental researches of optoelectric properties of porous silicon. Layers of porous silicon were formed using electrochemical etching process in water-alcohol solutions of hydrofluoric acid on plates with a pre-established microrelief surface. Evaluation of possibility of using of created structure as the artificial retina component was performed based on the results of the research.
Keywords:
porous silicon, electrolytic etching, texturized surface, photosensitivity, artificial retina.
Received: 14.09.2011 Revised: 24.10.2011
Citation:
N. V. Latukhina, G. A. Pisarenko, A. V. Volkov, V. A. Kitaeva, “Photosensitive matrix based on porous microcrystalline silicon”, Vestnik Samarskogo Gosudarstvennogo Universiteta. Estestvenno-Nauchnaya Seriya, 2011, no. 5(86), 115–121
Linking options:
https://www.mathnet.ru/eng/vsgu85 https://www.mathnet.ru/eng/vsgu/y2011/i5/p115
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Abstract page: | 173 | Full-text PDF : | 100 | References: | 34 | First page: | 1 |
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