Some physical aspects of ion implantation

Ion implantation and related processes of deposition and sputtering. – The nonequilibrium and metastable nature of ion-implanted structures. – Amorphous solids produced by ion implantation and planar structures that include them. – Recrystallization of layers doped or (and) amortised by ion implantation. – Analysis of the composition and properties of ion-implanted planar structures. – Method of analyzing spectra of photo- and cathodoluminescence of ion-implanted layers. – Optical methods for the study of near-surface layers of ion-implanted structures. – Capacitive spectroscopy of energy levels. – Limits of applicability of ion implantation as a method of controlling properties of semiconductors and other solids.