|
This article is cited in 49 scientific papers (total in 49 papers)
CONFERENCES AND SYMPOSIA
Beryllium-based multilayer X-ray optics
V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, N. I. Chkhalo Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod
Abstract:
The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) region. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies on the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of Si and Be interlayers on the reflectivity is explained. Avenues for further research on beryllium-containing mirrors are discussed.
Received: July 18, 2019 Accepted: May 22, 2019
Citation:
V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, N. I. Chkhalo, “Beryllium-based multilayer X-ray optics”, UFN, 190:1 (2020), 92–106; Phys. Usp., 63:1 (2020), 83–95
Linking options:
https://www.mathnet.ru/eng/ufn6629 https://www.mathnet.ru/eng/ufn/v190/i1/p92
|
Statistics & downloads: |
Abstract page: | 420 | Full-text PDF : | 39 | References: | 45 | First page: | 23 |
|