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Uspekhi Fizicheskikh Nauk, 2019, Volume 189, Number 7, Pages 673–690
DOI: https://doi.org/10.3367/UFNr.2018.10.038449
(Mi ufn6301)
 

This article is cited in 12 scientific papers (total in 13 papers)

REVIEWS OF TOPICAL PROBLEMS

Two-dimensional system of strongly interacting electrons in silicon (100) structures

V. T. Dolgopolovab

a Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka, Moscow region
b Editorial Board of JETP Letters
References:
Abstract: Studies of various experimental groups that explore the properties of a two-dimensional electron gas in silicon semiconductor systems ((100) Si-MOSFET and (100) SiGe/Si/SiGe quantum wells) in the vicinity of the metal–insulator transition are described and critically analyzed. Results are identified that are common to all research: (i) the effective mass of electrons measured at the Fermi level in the metallic region increases as the electron density decreases and, if extrapolated, tends to diverge; (ii) the behavior of the energy-averaged mass in the metallic region is quite different in the two systems: in Si-MOSFETs, it also exhibits a tendency to diverge, while in the SiGe/Si/SiGe quantum wells it saturates in the limit of low electron densities; (iii) there is a small number (depending on the sample quality) of localized electrons in the metallic phase; (iv) the properties that the electron system exhibits in the insulating phase in the vicinity of the metal–insulator transition are typical of amorphous media with a strong coupling between particles.
Funding agency Grant number
Russian Foundation for Basic Research 18-02-00368
Russian Academy of Sciences - Federal Agency for Scientific Organizations
The study was partially supported by the Russian Foundation for Basic Research (grant no. 18-02-00368) and the State Program of the Institute of Solid State Physics, RAS.
Received: April 28, 2018
Revised: October 7, 2018
Accepted: October 16, 2018
English version:
Physics–Uspekhi, 2019, Volume 62, Issue 7, Pages 633–648
DOI: https://doi.org/10.3367/UFNe.2018.10.038449
Bibliographic databases:
Document Type: Article
PACS: 71.27.+a, 71.30.+h, 73.20.-r
Language: Russian
Citation: V. T. Dolgopolov, “Two-dimensional system of strongly interacting electrons in silicon (100) structures”, UFN, 189:7 (2019), 673–690; Phys. Usp., 62:7 (2019), 633–648
Citation in format AMSBIB
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  • This publication is cited in the following 13 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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