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Uspekhi Fizicheskikh Nauk, 2017, Volume 187, Number 9, Pages 971–979
DOI: https://doi.org/10.3367/UFNr.2016.12.038008
(Mi ufn5783)
 

This article is cited in 9 scientific papers (total in 9 papers)

REVIEWS OF TOPICAL PROBLEMS

Hot electrons in silicon oxide

V. A. Gritsenkoabc

a Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
c Novosibirsk State Technical University
Full-text PDF (354 kB) Citations (9)
References:
Abstract: One particular application of amorphous silicon oxide ${\rm SiO_2}$, a material crucial for silicon device technology and design, is as a flash memory tunnel dielectric. The breakdown field of ${\rm SiO}_2$ exceeds $10^7$ V $\rm cm^{-1}$. Strong electric fields in ${\rm SiO}_2$ give rise to phenomena that do not occur in crystalline semiconductors. In relatively weak electric fields ($10^4 - 10^6$ V $\rm cm^{-1}$) the electron distribution function is determined by the scattering of electrons on longitudinal optical phonons. In high fields (in excess of $10^6$ V $\rm cm^{-1}$), the distribution function is determined by electron–acoustic phonon scattering.
Funding agency Grant number
Russian Science Foundation 14-19-00192
This study was partially supported by the Russian Scientific Foundation, grant No. 14-19-00192.
Received: September 2, 2016
Revised: December 7, 2016
Accepted: December 8, 2016
English version:
Physics–Uspekhi, 2017, Volume 60, Issue 9, Pages 902–910
DOI: https://doi.org/10.3367/UFNe.2016.12.038008
Bibliographic databases:
Document Type: Article
PACS: 72.20.Ht, 72.20.Jv, 72.80.Sk, 73.40.Sx
Language: Russian
Citation: V. A. Gritsenko, “Hot electrons in silicon oxide”, UFN, 187:9 (2017), 971–979; Phys. Usp., 60:9 (2017), 902–910
Citation in format AMSBIB
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  • This publication is cited in the following 9 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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    Успехи физических наук Physics-Uspekhi
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