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This article is cited in 9 scientific papers (total in 9 papers)
REVIEWS OF TOPICAL PROBLEMS
Hot electrons in silicon oxide
V. A. Gritsenkoabc a Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Novosibirsk
b Novosibirsk State University
c Novosibirsk State Technical University
Abstract:
One particular application of amorphous silicon oxide ${\rm SiO_2}$, a material crucial for silicon device technology and design, is as a flash memory tunnel dielectric. The breakdown field of ${\rm SiO}_2$ exceeds $10^7$ V $\rm cm^{-1}$. Strong electric fields in ${\rm SiO}_2$ give rise to phenomena that do not occur in crystalline semiconductors. In relatively weak electric fields ($10^4 - 10^6$ V $\rm cm^{-1}$) the electron distribution function is determined by the scattering of electrons on longitudinal optical phonons. In high fields (in excess of $10^6$ V $\rm cm^{-1}$), the distribution function is determined by electron–acoustic phonon scattering.
Received: September 2, 2016 Revised: December 7, 2016 Accepted: December 8, 2016
Citation:
V. A. Gritsenko, “Hot electrons in silicon oxide”, UFN, 187:9 (2017), 971–979; Phys. Usp., 60:9 (2017), 902–910
Linking options:
https://www.mathnet.ru/eng/ufn5783 https://www.mathnet.ru/eng/ufn/v187/i9/p971
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Abstract page: | 159 | Full-text PDF : | 21 | References: | 27 | First page: | 7 |
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