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Uspekhi Fizicheskikh Nauk, 1998, Volume 168, Number 10, Pages 1117–1127
DOI: https://doi.org/10.3367/UFNr.0168.199810c.1117
(Mi ufn1524)
 

This article is cited in 21 scientific papers (total in 21 papers)

REVIEWS OF TOPICAL PROBLEMS

Monatomic steps on silicon surfaces

A. V. Latyshev, A. L. Aseev

Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
Abstract: The results of studies of monatomic steps on silicon surfaces using in situ ultrahigh vacuum reflection electron microscopy are reviewed. The topics covered include the increase in dynamic step edge stiffness under non-equilibrium conditions; step bunch and step antibunch formation processes; electromigration effects; the anomalously high density of Si(111) adatoms; and incipient epitaxial growth.
Received: December 31, 1998
English version:
Physics–Uspekhi, 1998, Volume 41, Issue 10, Pages 1015–1023
DOI: https://doi.org/10.1070/PU1998v041n10ABEH000462
Bibliographic databases:
Document Type: Article
PACS: 68.35.p, 68.55.a, 81.15.Hi
Language: Russian


Citation: A. V. Latyshev, A. L. Aseev, “Monatomic steps on silicon surfaces”, UFN, 168:10 (1998), 1117–1127; Phys. Usp., 41:10 (1998), 1015–1023
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  • This publication is cited in the following 21 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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