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This article is cited in 21 scientific papers (total in 21 papers)
REVIEWS OF TOPICAL PROBLEMS
Monatomic steps on silicon surfaces
A. V. Latyshev, A. L. Aseev Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk
Abstract:
The results of studies of monatomic steps on silicon surfaces using in situ ultrahigh vacuum reflection electron microscopy are reviewed. The topics covered include the increase in dynamic step edge stiffness under non-equilibrium conditions; step bunch and step antibunch formation processes; electromigration effects; the anomalously high density of Si(111) adatoms; and incipient epitaxial growth.
Received: December 31, 1998
Citation:
A. V. Latyshev, A. L. Aseev, “Monatomic steps on silicon surfaces”, UFN, 168:10 (1998), 1117–1127; Phys. Usp., 41:10 (1998), 1015–1023
Linking options:
https://www.mathnet.ru/eng/ufn1524 https://www.mathnet.ru/eng/ufn/v168/i10/p1117
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Abstract page: | 260 | Full-text PDF : | 85 | First page: | 1 |
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