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Uspekhi Fizicheskikh Nauk, 1996, Volume 166, Number 8, Pages 859–871
DOI: https://doi.org/10.3367/UFNr.0166.199608c.0859
(Mi ufn1214)
 

This article is cited in 26 scientific papers (total in 26 papers)

REVIEWS OF TOPICAL PROBLEMS

Cathodoluminescence microscopy

V. I. Petrov

Lomonosov Moscow State University
Abstract: Being the source of light quanta in optoelectronic devices like semiconductor lasers and light-emitting diodes, radiation recombination processes are of great importance in the constituent semiconducting structures. The latter consist of thin epitaxial layers, and their radiative recombination efficiency depends on structural imperfections such as dislocations, usually acting as nonradiative recombination centres, and point defects. Since these imperfections usually have a nonuniform layer distribution, radiation characteristics are distributed inhomogeneously over the layers and small-scale structural elements. For such structures, therefore, cathodoluminescence scanning microscopy, controlling the microlevel distribution of radiation characteristics, is an irreplaceable research tool. The effective use of this technique requires a correct understanding of the radiation-producing processes occurring during the electron probe—semiconductor interaction. A knowledge of the potential and the information capacity of the method is essential.
Received: July 1, 1996
English version:
Physics–Uspekhi, 1996, Volume 39, Issue 8, Pages 807–818
DOI: https://doi.org/10.1070/PU1996v039n08ABEH000162
Bibliographic databases:
Document Type: Article
PACS: 07.79.-v, 61.16.Ch
Language: Russian


Citation: V. I. Petrov, “Cathodoluminescence microscopy”, UFN, 166:8 (1996), 859–871; Phys. Usp., 39:8 (1996), 807–818
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  • This publication is cited in the following 26 articles:
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