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This article is cited in 10 scientific papers (total in 10 papers)
Plasma Investigations
Efficiency of the plasma-chemical method of preparation of silicon from quartz in an argon-hydrogen flow
Yu. M. Grishin, N. P. Kozlov, A. S. Skryabin Bauman Moscow State Technical University
Abstract:
A kinetic model of nonequilibrium chemical processes in gas mixtures of $\rm Si$, $\rm O$, $\rm H$, and $\rm Ar$ and a model of the calculation of the main parameters of plasma facilities for the implementation of the plasmachemical method of the direct preparation of silicon from quartz in argon–hydrogen gas-plasma flows have been formulated. The criteria and general conditions at which the maximal yield of silicon is achieved were determined. The main mode and construction parameters of plasma facilities were determined. It is shown that at the consumed electrical power of a stationary plasmatron of $100$ kW the calculated efficiency of the facility (over vapor $\rm Si$) could be on the order of $10^{–2}$ g/s.
Received: 12.12.2014 Accepted: 10.03.2015
Citation:
Yu. M. Grishin, N. P. Kozlov, A. S. Skryabin, “Efficiency of the plasma-chemical method of preparation of silicon from quartz in an argon-hydrogen flow”, TVT, 54:5 (2016), 655–662; High Temperature, 54:5 (2016), 619–626
Linking options:
https://www.mathnet.ru/eng/tvt7968 https://www.mathnet.ru/eng/tvt/v54/i5/p655
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Abstract page: | 256 | Full-text PDF : | 109 | References: | 37 | First page: | 1 |
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