Teplofizika vysokikh temperatur
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Teplofizika vysokikh temperatur, 1995, Volume 33, Issue 1, Pages 163–166 (Mi tvt2896)  
This article is cited in 1 scientific paper (total in 1 paper)

Short Communications

Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum

A. V. Kostanovskii, M. K. Gusev

Institute for High Temperatures, Russian Academy of Sciences, Moscow
Full-text PDF (1366 kB) Citations (1)
Received: 04.03.1994
Bibliographic databases:
Document Type: Article
UDC: 546.621.171.539.216
Language: Russian
Citation: A. V. Kostanovskii, M. K. Gusev, “Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum”, TVT, 33:1 (1995), 163–166; High Temperature, 33:1 (1995), 162–164
Citation in format AMSBIB
\Bibitem{KosGus95}
\by A.~V.~Kostanovskii, M.~K.~Gusev
\paper Deposition of thin films during thermal vaporization of aluminum nitride in a vacuum
\jour TVT
\yr 1995
\vol 33
\issue 1
\pages 163--166
\mathnet{http://mi.mathnet.ru/tvt2896}
\transl
\jour High Temperature
\yr 1995
\vol 33
\issue 1
\pages 162--164
\isi{https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=Publons&SrcAuth=Publons_CEL&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=A1995QM61500032}
Linking options:
  • https://www.mathnet.ru/eng/tvt2896
  • https://www.mathnet.ru/eng/tvt/v33/i1/p163
    • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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