Teplofizika vysokikh temperatur
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Teplofizika vysokikh temperatur, 1998, Volume 36, Issue 2, Pages 279–284 (Mi tvt2860)  
Heat and Mass Transfer and Physical Gasdynamics

Special features of gasdynamic and diffusion processes in reactors for deposition of thin films

G. G. Gladush, L. G. Kurkina, N. B. Rodionov

Troitsk Institute for Innovation and Fusion Research
Full-text PDF (1750 kB)
Received: 07.08.1996
Bibliographic databases:
Document Type: Article
UDC: 533.9
Language: Russian
Citation: G. G. Gladush, L. G. Kurkina, N. B. Rodionov, “Special features of gasdynamic and diffusion processes in reactors for deposition of thin films”, TVT, 36:2 (1998), 279–284; High Temperature, 36:2 (1998), 263–268
Citation in format AMSBIB
\Bibitem{GlaKurRod98}
\by G.~G.~Gladush, L.~G.~Kurkina, N.~B.~Rodionov
\paper Special features of gasdynamic and diffusion processes in reactors for deposition of thin films
\jour TVT
\yr 1998
\vol 36
\issue 2
\pages 279--284
\mathnet{http://mi.mathnet.ru/tvt2860}
\transl
\jour High Temperature
\yr 1998
\vol 36
\issue 2
\pages 263--268
\isi{https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=Publons&SrcAuth=Publons_CEL&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=000073142400016}
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  • https://www.mathnet.ru/eng/tvt2860
  • https://www.mathnet.ru/eng/tvt/v36/i2/p279
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