An investigation of spatial distribution of laser ablation products and their deposition on a substrate in the case of laser action with sharp focusing

Results are given of numerical simulation of the effect of laser radiation at a wavelength of $1.313$ $\mu$m with sharp focusing on a silicon target. The behavior of the gasdynamic parameters is investigated, as well as the characteristic features of the modes of plasma formation, under such irradiation. The pattern is determined of the dependence of configuration and velocity of motion of the cloud boundary on the size of irradiation spot, angle of convergence of incident radiation, and its intensity. The time dependences are obtained for the temperature and density within the plasma cloud. The possibility of spraying the laser ablation products onto a substrate is assessed, and the configurations of deposited film are calculated for different modes of irradiation.