Formation of a thin film containing $\alpha$-carbine in the magnetron sputtering of graphite targets and the impact of an external photoactivation source

The possibility of formation of a thin film containing $\alpha$-carbine in magnetron sputtering of graphite targets and the impact of an external photoactivation source with the spectral density of the radiation flux $\sim5\times10^8\text{W/m}^3$ at the wavelength of $300\text{ nm}$ and at the substrate temperature $\sim660\text{ K}$ is shown experimentally.