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Teplofizika vysokikh temperatur, 2014, Volume 52, Issue 5, Pages 670–676
DOI: https://doi.org/10.7868/S0040364414050068
(Mi tvt1240)
 

This article is cited in 11 scientific papers (total in 11 papers)

Thermophysical Properties of Materials

Computer simulation of the thermal stability of nickel films on two-layer graphene

A. E. Galashev

Institute of Industrial Ecology Ural Branch of RAS, Ekaterinburg
References:
Abstract: The structure and the dynamic and mechanical properties of monolayer nickel films deposited on two-layer graphene have been studied in the temperature range $300 \le T \le 3300$ K by the molecular dynamics method. A part of the $\text{Ni}$ atoms remains on the graphene sheet even at $T = 3300$ K for both one- and two-sided coatings. The radial distribution functions of the upper and lower metal films differ significantly even at $T = 300$ K. The temperature dependence of the horizontal and vertical components of the self-diffusion coefficient of a one-sided nickel film exhibits a jump above $1800$ K. No similar specific feature was observed for a two-sided coating of graphene with this film. The stress components acting in the nickel film plane disappear with an increase in temperature for a shorter time in the case of one-sided coating.
Received: 18.06.2013
English version:
High Temperature, 2014, Volume 52, Issue 5, Pages 633–639
DOI: https://doi.org/10.1134/S0018151X1405006X
Bibliographic databases:
Document Type: Article
UDC: 539.216:536.42
Language: Russian
Citation: A. E. Galashev, “Computer simulation of the thermal stability of nickel films on two-layer graphene”, TVT, 52:5 (2014), 670–676; High Temperature, 52:5 (2014), 633–639
Citation in format AMSBIB
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  • This publication is cited in the following 11 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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