Laser-induced chemical deposition from the gas phase

The results of the study of the chemical reactions involved in the deposition of various substances from the gas phase using the pulsed, quasi-continuous, and continuous laser radiation in the wavelength range 0.193–10.6 μm have been summarised. Particular attention has been paid to the deposition of inorganic substances, including non-metals (C, Si, Ge, etc.), metals (Cu, Au, Zn, Cd, Al, Cr, Mo, W, Ni), and a number of simple compounds. Detailed experimental data are given on the influence of the radiation parameters (wavelength, duration and spacing of the pulses, intensity of radiation, shape and position of the laser beam) and the nature of the reagents (hydrides, halides, carbonyls, alkyl organometallic compounds, etc.) on the rate of deposition and the composition of the deposit. The characteristics of photolytic deposition reactions and their possible applications have been examined.
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