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Russian Chemical Reviews, 2013, Volume 82, Issue 9, Pages 815–834
DOI: https://doi.org/10.1070/RC2013v082n09ABEH004357 (Mi rcr664) 		 
This article is cited in 15 scientific papers (total in 15 papers)

Activation of solid-phase processes by radiation of gas-discharge lamps

V. M. Ievlev

Voronezh State Technical University
English full-text Citations (15)
DOI: https://doi.org/10.1070/RC2013v082n09ABEH004357
Abstract: Results of studies on application of broadband radiation of gas-discharge lamps for activation of solid-phase processes including the synthesis of thin films, nanocrystallization of amorphous structures, recrystallization and modification of thin films formed by various methods are analyzed and generalized. Compared to conventional thermal processing, the effect of photon treatment manifests itself in acceleration of processes, higher degree of dispersion of structures formed and in reduction of temperature thresholds for the phase formation. Prospects for application of photon activation in technological processes are discussed.
The bibliography includes 142 references.
Received: 29.10.2012
Russian version:
Uspekhi Khimii, 2013, Volume 82, Issue 9, Pages 815–834
DOI: https://doi.org/10.1070/RC2013v082n09ABEH004357
Bibliographic databases:
Document Type: Article
Language: English
Original paper language: Russian
Citation: V. M. Ievlev, “Activation of solid-phase processes by radiation of gas-discharge lamps”, Usp. Khim., 82:9 (2013), 815–834; Russian Chem. Reviews, 82:9 (2013), 815–834
Citation in format AMSBIB
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    • This publication is cited in the following 15 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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