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Russian Chemical Reviews, 1983, Volume 52, Issue 8, Pages 775–803
DOI: https://doi.org/10.1070/RC1983v052n08ABEH002883
(Mi rcr3490)
 

This article is cited in 5 scientific papers (total in 5 papers)

The Technology, Structure, and Properties of Organosilicon Dielectrics-polyorganosilasesquioxanes

A. M. Ton'shina, B. A. Kamaritskiib, V. N. Spektorb

a Moscow State (V. I. Lenin) Pedagogical Institute
b Institute of Chemical Physics of the USSR Academy of Sciences, Moscow
English full-text Citations (5)
Abstract: The available information about the technology of the preparation of polyorganosilasesquioxanes, their structure, and properties is described systematically, surveyed, and compared with that on inorganic oxide dielectrics. The possibilities and advantages of their application as dielectric materials in semiconductor electronics are examined; analysis of the experimental literature data has led to the conclusion that the method of preparation has a decisive influence on the mechanism of the formation of oligomer molecules their conversion into polymers, and their interaction with various supports.
The bibliography includes 281 references.
Russian version:
Uspekhi Khimii, 1983, Volume 52, Issue 8, Pages 1365–1409
DOI: https://doi.org/10.1070/RC1983v052n08ABEH002883
Bibliographic databases:
Document Type: Article
UDC: 546.267:547.121
Language: English
Original paper language: Russian


Citation: A. M. Ton'shin, B. A. Kamaritskii, V. N. Spektor, “The Technology, Structure, and Properties of Organosilicon Dielectrics-polyorganosilasesquioxanes”, Usp. Khim., 52:8 (1983), 1365–1409; Russian Chem. Reviews, 52:8 (1983), 775–803
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  • https://doi.org/10.1070/RC1983v052n08ABEH002883
  • https://www.mathnet.ru/eng/rcr/v52/i8/p1365
  • This publication is cited in the following 5 articles:
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