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Kvantovaya Elektronika, 1979, Volume 6, Number 8, Pages 1639–1647 (Mi qe9388)  

This article is cited in 3 scientific papers (total in 3 papers)

Kinetics of a gas-discharge XeF excimer laser

M. M. Mkrtchyan, V. T. Platonenko
Abstract: An investigation is made of the kinetics of evolution of a pulsed discharge and accumulation of excited XeF* excimers in an He–Xe–NF3 mixture. A kinetic model is proposed for a pulsed gas-discharge laser. This can be used to predict the optimal mixture pressure and pulse duration and to estimate the excited excimer concentrations attainable under optimal pulsed discharge conditions.
Received: 20.10.1978
English version:
Soviet Journal of Quantum Electronics, 1979, Volume 9, Issue 8, Pages 967–971
DOI: https://doi.org/10.1070/QE1979v009n08ABEH009388
Document Type: Article
UDC: 621.373.826.038
PACS: 42.55.Hq
Language: Russian


Citation: M. M. Mkrtchyan, V. T. Platonenko, “Kinetics of a gas-discharge XeF excimer laser”, Kvantovaya Elektronika, 6:8 (1979), 1639–1647 [Sov J Quantum Electron, 9:8 (1979), 967–971]
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  • https://www.mathnet.ru/eng/qe/v6/i8/p1639
  • This publication is cited in the following 3 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
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