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Kvantovaya Elektronika, 1985, Volume 12, Number 12, Pages 2498–2501 (Mi qe8096)  

This article is cited in 1 scientific paper (total in 1 paper)

Brief Communications

Characteristics of the use of pulsed ultraviolet lasers in photolithography

A. L. Bogdanov, K. A. Valiev, L. V. Velikov, D. Yu. Zaroslov, A. P. Zakharov, A. M. Prokhorov
Full-text PDF (834 kB) Citations (1)
Abstract: The characteristic features of the use of pulsed ultraviolet lasers in photolithography were studied, including the high pulse power and monochromaticity of laser radiation. An experimental study was made of the photolithographic process carried out using a pulsed nitrogen laser emitting at λ = 337 nm. Structures of (1.2–1.3)λ size were formed in FP-617 photoresist.
Received: 14.03.1985
English version:
Soviet Journal of Quantum Electronics, 1985, Volume 15, Issue 12, Pages 1654–1656
DOI: https://doi.org/10.1070/QE1985v015n12ABEH008096
Bibliographic databases:
Document Type: Article
UDC: 621.3.049.77.022:621.373.826
PACS: 42.55.Lt, 42.60.Jf, 42.82.Cr
Language: Russian


Citation: A. L. Bogdanov, K. A. Valiev, L. V. Velikov, D. Yu. Zaroslov, A. P. Zakharov, A. M. Prokhorov, “Characteristics of the use of pulsed ultraviolet lasers in photolithography”, Kvantovaya Elektronika, 12:12 (1985), 2498–2501 [Sov J Quantum Electron, 15:12 (1985), 1654–1656]
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  • https://www.mathnet.ru/eng/qe8096
  • https://www.mathnet.ru/eng/qe/v12/i12/p2498
  • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Квантовая электроника Quantum Electronics
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