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Influence of the xenon concentration on the intensity of lasing due to high rotational levels of an XeF laser
N. G. Zubrilin, P. I. Korenyuk, M. P. Chernomorets
Abstract:
An experimental investigation was made of the dependence of the laser emission spectrum from an electric-discharge XeF laser on the xenon concentration in the mixture. It was established that a high content of xenon is a necessary condition for the existence of lasing due to high rotational levels.
Received: 05.04.1990
Citation:
N. G. Zubrilin, P. I. Korenyuk, M. P. Chernomorets, “Influence of the xenon concentration on the intensity of lasing due to high rotational levels of an XeF laser”, Kvantovaya Elektronika, 17:12 (1990), 1561–1562 [Sov J Quantum Electron, 20:12 (1990), 1462–1463]
Linking options:
https://www.mathnet.ru/eng/qe7605 https://www.mathnet.ru/eng/qe/v17/i12/p1561
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