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Influence of adhesion on processes of laser heating and damage to thin absorbing films
E. B. Yakovlev
Abstract:
A phenomenological approach is proposed to allow for the influence of adhesion on the rate of heating of thin films exposed to laser radiation. It is found that the adhesion determines the mechanism of damage to thin films in the advanced damage threshold regime. Conditions for which the melt rolling mechanism of damage to thin films predominates in the advanced damage threshold regime are determined.
Received: 24.09.1980
Citation:
E. B. Yakovlev, “Influence of adhesion on processes of laser heating and damage to thin absorbing films”, Kvantovaya Elektronika, 8:5 (1981), 1073–1078 [Sov J Quantum Electron, 11:5 (1981), 637–640]
Linking options:
https://www.mathnet.ru/eng/qe6944 https://www.mathnet.ru/eng/qe/v8/i5/p1073
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