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This article is cited in 2 scientific papers (total in 2 papers)
Brief Communications
Fabrication and investigation of thin-film CdSxSe1–x waveguides
Z. È. Buachidze, I. V. Vasilishcheva, V. N. Morozov, V. A. Pletnev, A. S. Semenov, P. V. Shapkin
Abstract:
The diffusion method was used to fabricate CdSxSe1–x solid-solution waveguides with losses in the range 9–13 dB/cm. The refractive index profile of these waveguides was determined. Photochemical etching of the waveguide surface was employed to form diffraction gratings with 103 lines/mm and a relief 40-nm deep.
Received: 25.06.1982
Citation:
Z. È. Buachidze, I. V. Vasilishcheva, V. N. Morozov, V. A. Pletnev, A. S. Semenov, P. V. Shapkin, “Fabrication and investigation of thin-film CdSxSe1–x waveguides”, Kvantovaya Elektronika, 9:11 (1982), 2329–2330 [Sov J Quantum Electron, 12:11 (1982), 1514–1516]
Linking options:
https://www.mathnet.ru/eng/qe6179 https://www.mathnet.ru/eng/qe/v9/i11/p2329
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