Optimal regime for forming topological patterns when processing films with laser radiation

The results are given of an experimental investigation of the physical and technological laws governing the formation of individual precision components in thin films, and of the synthesis of these pattern components using the contour-projection method. A study was made of the influence on the quality of the synthesized pattern of the degree of overlapping of the neighboring components. The results of the experiments were used to establish the fundamental limitations of this method. A method is proposed for selecting the optimal processing regime.